Student receives best paper award

Hyung Joo Lee, a chemical engineering Ph.D. student, will receive the best paper award at the Advanced Equipment Control/Advanced Process Control Symposium for his research in eliminating systematic disturbances and improving chamber-to-chamber matching in semiconductors. Lee, who is supervised by Chemical Engineering Professor Thomas Edgar, received first place for his paper titled “Wafer-To-Wafer Feedback Control For High Volume Polysilicon Gate Etch Process Using Integrated Scatterometry.”